Antioxidant BHT 264
CAS:128-37-0
Purity:99%
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Product Details
| Description | 2-Ethyl-2-Adamantyl Methacrylate is a specialty monomer utilized in biomedical research, primarily for the synthesis of polymers. |
| Uses | 2-Ethyl-2-adamantyl methacrylate is a monomer used in the synthesis of organic compounds. It is commonly used as a monomer in the synthesis of polymers, offering enhanced mechanical properties and thermal stability. |
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Preparation |
The preparation of 2-Ethyl-2-adamantyl methacrylate is as follows:Add 2175ml of n-hexane to the 3L four-necked flask equipped with stirring paddle, condenser tube and thermometer, turn on stirring, add 97g of 2-ethyladamantanol to the system, and slowly add 0.0072g of polymerization inhibitor tetrachlorobenzoquinone to the reaction system , add 72.5g of basic ion exchange resin, adjust pH=7-8, cool down to -10°C, slowly add 72.5g of vinyl methacrylate dropwise to the reaction system, keep the reaction for 6h, monitor the reaction progress, take a sample to detect the reaction is complete After adding 800 ml of water to the reaction system, stirring and extracting the phases, the organic phase was dried, concentrated under reduced pressure and evaporated to dryness to obtain 125 g of 2-ethyl-2-adamantyl methacrylate product with a yield of 93.45%. |
InChI:InChI=1/C16H24O2/c1-4-16(18-15(17)10(2)3)13-6-11-5-12(8-13)9-14(16)7-11/h11-14H,2,4-9H2,1,3H3
ArF photoresist polymers were prepared via reversible addition-fragmentation chain transfer (RAFT) polymerization and free radical polymerization (FRP). Three methacrylates with lithographic functionalities including 2-ethyl-2-adamantyl methacrylate (EAdMA), α-gamma-butyrolactone methacrylate (GBLMA), and 3-hydroxy-1-adamantyl methacrylate (HAdMA), were used as monomer components and 2-cyanoprop-2-yl-1-dithionaphthalate (CPDN) was used as the chain transfer agent (CTA).
Polymer bound PAG resists, poly(4-hydroxystyrene-co-2-ethyl-2-adamantyl methacrylate-co-PAG1) [poly(HOST-co-EAMA-co-PAG1)] and poly(4-hydroxystyrene-co-2-ethyl-2-adamantyl methacrylate-co-PAG2) [poly(HOST-co-EAMA-co-PAG2)] have been synthesized and evaluated as potential components of EUV resist materials with enhanced lithographic properties such as photospeed and Line Edge Roughness (LER).
2-Adamantanone
adamantane
2-ethyl-2-adamantanol
