Antioxidant BHT 264
CAS:128-37-0
Purity:99%
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Product Details
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Chemical Properties |
Colorless liquid |
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Uses |
Tris(trimethylsilyl) phosphite (TMSPi) is a film-forming additive for high voltage cathode material in lithium-ion batteries. Tris (trimethylsilyl) phosphate is cleaved by alkali-metal fluorides, nitrates, and acetates at give the trimethylsilyl esters of the corresponding acids. |
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Definition |
ChEBI: Tris(trimethylsilyl) phosphate is an organosilicon compound that is phosphoric acid in which the three hydroxy groups are substituted by (trimethylsilyl)oxy groups. It is a phosphoric acid derivative and an organosilicon compound. |
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Preparation |
Tris(trimethylsilyl)phosphine is prepared by treating trimethylsilyl chloride, white phosphorus, and sodium-potassium alloy: 1/4 P4 + 3 Me3SiCl + 3 K → P(SiMe3)3 + 3 KCl |
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General Description |
Tris(trimethylsilyl) phosphate has been investigated as a novel film-forming additive for LiNi0.5Co0.2Mn0.3O2 cycling at high cut-off potential in LiPF6-based electrolyte. Tris(trimethylsilyl) phosphate [Tris(trimethylsilyl) ester of phosphoric acid] undergoes dealkylsilylation reaction with alumazene to yield heteroadamantane molecule. |
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Flammability and Explosibility |
Notclassified |
InChI:InChI=1/C9H27O4PSi3/c1-15(2,3)11-14(10,12-16(4,5)6)13-17(7,8)9/h1-9H3
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The condensation reaction between Ph2Si(...
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Starting from an optimized synthesis of ...
Three new molecular zinc compounds were ...
A novel phosphorus derivative was synthe...
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The invention discloses a method for syn...
The preparation method of the phosphate ...
chloro-trimethyl-silane
Tris(trimethylsilyl) phosphate
| Conditions | Yield |
|---|---|
|
With
potassium dihydrogenphosphate;
In
hexane;
Reflux;
|
96% |
|
With
ammonium dihydrogen phosphate;
at 78 ℃;
for 3h;
Temperature;
Reagent/catalyst;
Time;
|
89.6% |
|
With
phosphoric acid;
|
|
|
With
phosphoric acid;
Schlenk technique;
Inert atmosphere;
|
|
|
With
phosphoric acid;
Inert atmosphere;
|
Hexamethyldisiloxane
N-trimethylsilyldihydropyrrole
Tris(trimethylsilyl) phosphate
| Conditions | Yield |
|---|---|
|
Hexamethyldisiloxane;
With
phosphoric acid;
at 160 - 170 ℃;
for 5h;
under 4500.45 - 6000.6 Torr;
Autoclave;
Reflux;
N-trimethylsilyldihydropyrrole;
at 100 ℃;
under 760.051 Torr;
|
96.52% |
chloro-trimethyl-silane
Trimethylmethoxysilane
Hexamethyldisiloxane
phosphoric acid, bis(trimethylsilyl)monomethyl ester
trimethylsilyl acetate
bis(trimethylsilyl) 5-chloro-1-(4-chlorobenzyloxy)methyl-2-oxo-3-trimethylsilyl-3,4-dihydropyrimidine-4-phosphonate
trimethylsilyl fluoride
trimethylsilylazide
